Description
Sapphire Wafer and Sapphire substrate
Sapphire substrate is widely used in LED Semiconductor devices, electronics, communications, laser, infrared military installations, satellite space technology and other technology areas. Its unique structure, excellent mechanical and good
thermal properties make sapphire crystal into the best material of semiconductor light emitingdiode (LED) application, large scale integrated circuits and thin film super conduction nanostructures.Jlike Optics provide high quality sapphire substrate to you
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Crystal Materials |
99.995% High Purity, 2-3 Grade Monocrystalline Al2O3
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Wafer Surface Orientation |
C-axis(0001) to M (1-100) or A (11-20) 0.2°±0.1°
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Diameter
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50.8mm ± 0.1mm |
76.2mm ± 0.25mm
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100.0 ± 0.4mm
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150.0 ± 0.5mm
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Thickness
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430±15µm 330±15µm |
650±25µm 430±25µm
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650±25µm 550±25µm
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1000±25µm
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Major Flat
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A-axis (1 1 - 2 0) ± 0.2°
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Major Flat Length
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16.0mm ± 1.0mm
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22.0mm ± 1.0mm
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32.5 ± 1.0mm
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57.0 ± 1.0mm
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Front Surface
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Epi polished, Ra< 0.30nm |
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Back Surface
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Fine ground (Ra ≈ 1.0 µm) |
Epi-Polished ( Ra< 0.30nm); or Fine ground
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Edge Condition |
Edge defects not to exceed SEMI M3-91 |
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TTV
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≤5um |
≤5um
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≤5um
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≤5um |
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BOW
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≤5um
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≤5um
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≤7um
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≤15um
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Warp
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≤5um
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≤5um
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≤7um
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≤15um
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Surface Qulity
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Epi-ready |
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Packaging
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Packaged in a class 100 clean room environment, in cassettes of 25pcs or single package, under a nitrogen atmospher |
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Note
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R-plane (1-1 0 2), A-plane (1 1-2 0 ), and M-plane(1-1 0 0) are available; Customer's specification not listed above is also available upon request. |
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